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photomask
光掩模
常用释义
词性释义
n.
光罩;[电子] 光掩模
例句
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These
nodes
may
then
be cross mapped
from
the
circuit
design
onto the
chips
layout
for each
of
multiple
photomask
layers
within the design
.
然后,这些节点从电路设计交互映射到设计中复合光掩模层的每一层芯片布局中。
A
novel
method
and
system
for
photomask
manufacturing
rule
check
(MRC)
were
introduced
.
介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。
Shown
here
is
a
photomask
,
which
bears
the
patterns
that
will
be
printed
onto
a
wafer
.
此图显示的就是光掩膜,上面印有将打印到硅晶片上的图案。
In
order
to
repair
the
clear
defects of
photomask
,
photolytic LCVD
process
is
required
to
initiate
the
chemical
reactions
.
为了对透明光掩模亮场区域进行修补,需要光化学解离过程诱导反应发生;
determining
effective
adhesion
of
photoresist
to hard
-
surface
photomask
blanks
and
semiconductor
wafers
during etching
测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性
Test
Method
for
Calibration
Verification
of
Laser
Diffraction
Particle
Sizing
Instruments
Using
Photomask
Reticles
用光掩模原版校准检验激光绕射粒子定尺寸仪器的试验方法
Guidelines
for
photomask
defect
classification
and
size
definition
光掩模缺陷分类和尺寸定义的准则
Improvement
of
Development
Property
of
IP
Resist
on
Photomask
by
Plasma
Surface
Pretreatment
利用等离子体表面预处理改善光掩模IP胶显影工艺特性
Specification
for
round
quartz
photomask
substrates
圆形石英玻璃光掩模基板规范
Advanced
Photomask
Technology
Trend
and
Development
先进光掩膜技术趋势与发展